Atomic layer deposition

Forge Nano Awarded 5-million-dollar Department of Energy Grant for Catalyst Optimization

Retrieved on: 
Tuesday, February 23, 2021
Semiconductor device fabrication, Thin film deposition, Climate change policy in the United States, Energy policy of the United States, Office of Energy Efficiency and Renewable Energy, Atomic layer deposition, United States Department of Energy, EER, Chemistry, Physical sciences, Energy

DENVER, Feb. 23, 2021 /PRNewswire/ --Forge Nano awarded DOE grant to improve chemical manufacturing efficiency using proprietary Atomic Layer Deposition technology.

Key Points: 
  • DENVER, Feb. 23, 2021 /PRNewswire/ --Forge Nano awarded DOE grant to improve chemical manufacturing efficiency using proprietary Atomic Layer Deposition technology.
  • In January, the U.S. Department of Energy's (DOE's) Office of Energy Efficiency and Renewable Energy (EERE) announced grant winners/awardees of the Advanced Manufacturing Office FY20 Multitopic FOA.
  • Forge Nano was awarded $5-million to further understand the specific mechanisms at play with ALD overcoating of catalysts for chemical manufacturing.
  • Forge Nano will reduce the energy footprint of a wide array of commodity and specialty chemical manufacturing processes using ALD.

PICOSUN® Sprinter disrupts fast batch ALD on 300 mm wafers

Retrieved on: 
Wednesday, December 2, 2020
Semiconductor device fabrication, Thin film deposition, Atomic layer deposition, Physical sciences, Chemistry, Natural sciences, Wafer, ALD, Thin film

ESPOO, Finland, Dec. 2, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, has launched Sprinter , a brand new, fully automated high throughput ALD production module for 300 mm wafers.

Key Points: 
  • ESPOO, Finland, Dec. 2, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, has launched Sprinter , a brand new, fully automated high throughput ALD production module for 300 mm wafers.
  • Compared to vertical furnace reactors typically used for batch ALD processing, Sprinter provides higher film quality with lower thermal budget, so it is suitable also for temperature-sensitive devices.
  • "PICOSUN Sprinter meets directly the challenges in high volume ALD manufacturing on 300 mm wafers.
  • (*)PICOSUNSprinter ALD batch process data on 300 mm Si wafers, Al2O3 process as an example (more data available on request):

PICOSUN® Sprinter disrupts fast batch ALD on 300 mm wafers

Retrieved on: 
Wednesday, December 2, 2020
Semiconductor device fabrication, Thin film deposition, Atomic layer deposition, Physical sciences, Chemistry, Natural sciences, Wafer, ALD, Thin film

ESPOO, Finland, Dec. 2, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, has launched Sprinter , a brand new, fully automated high throughput ALD production module for 300 mm wafers.

Key Points: 
  • ESPOO, Finland, Dec. 2, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, has launched Sprinter , a brand new, fully automated high throughput ALD production module for 300 mm wafers.
  • Compared to vertical furnace reactors typically used for batch ALD processing, Sprinter provides higher film quality with lower thermal budget, so it is suitable also for temperature-sensitive devices.
  • "PICOSUN Sprinter meets directly the challenges in high volume ALD manufacturing on 300 mm wafers.
  • (*)PICOSUNSprinter ALD batch process data on 300 mm Si wafers, Al2O3 process as an example (more data available on request):

Picosun's medical ALD solutions enable safer surgeries

Retrieved on: 
Monday, November 23, 2020
Thin film deposition, Semiconductor device fabrication, Physical sciences, Atomic layer deposition, ALD, Chemistry, Natural sciences, Thin film

ESPOO, Finland, Nov. 23, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions, partners with prominent Chinese hospitals and researchers to apply medical ALD technology for safer surgical procedures.

Key Points: 
  • ESPOO, Finland, Nov. 23, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions, partners with prominent Chinese hospitals and researchers to apply medical ALD technology for safer surgical procedures.
  • "It's great to collaborate with a company such as Picosun to develop solutions for safer and more patient-friendly surgeries.
  • Picosun is the leader in medical ALD solutions.
  • The company has extensive process portfolio for biocompatible ALD materials and their equipment are at use at several medical equipment manufacturers around the world.

Picosun's medical ALD solutions enable safer surgeries

Retrieved on: 
Monday, November 23, 2020
Thin film deposition, Semiconductor device fabrication, Physical sciences, Atomic layer deposition, ALD, Chemistry, Natural sciences, Thin film

ESPOO, Finland, Nov. 22, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions, partners with prominent Chinese hospitals and researchers to apply medical ALD technology for safer surgical procedures.

Key Points: 
  • ESPOO, Finland, Nov. 22, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions, partners with prominent Chinese hospitals and researchers to apply medical ALD technology for safer surgical procedures.
  • "It's great to collaborate with a company such as Picosun to develop solutions for safer and more patient-friendly surgeries.
  • Picosun is the leader in medical ALD solutions.
  • The company has extensive process portfolio for biocompatible ALD materials and their equipment are at use at several medical equipment manufacturers around the world.

Atomic Layer Deposition Equipment Market Expected to Reach USD 3,755.3 Million by 2027 With A CAGR Of 10.4% | Growth Market Reports

Retrieved on: 
Monday, November 9, 2020
Semiconductor device fabrication, Thin film deposition, Industrial processes, Atomic layer deposition, Physical sciences, Chemistry, ALD, Amorphous silicon, Tuomo Suntola

The global atomic layer deposition equipment market is fragmented based on types, by application, and region.

Key Points: 
  • The global atomic layer deposition equipment market is fragmented based on types, by application, and region.
  • On the basis of types, the atomic layer deposition equipment market is segmented into metal ALD, aluminum oxide ALD, plasma enhanced ALD, catalytic ALD, and others.
  • Based on applications, the atomic layer deposition equipment market is categorized as research & development facilities, semiconductor & electronics, solar devices, medical equipment, and others.
  • Based on region, the global Atomic Layer Deposition Equipment market is segmented into North America, Europe, Asia Pacific, Latin America and Middle East & Africa (MEA).

Picosun's cluster ALD solutions enable next generation power electronics

Retrieved on: 
Tuesday, October 6, 2020
Semiconductor device fabrication, Articles, Thin film deposition, Physical sciences, Chemistry, Atomic layer deposition, ALD, Thin film, Wafer, Renewable energy

ESPOO, Finland, Oct. 6, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, strengthens its position in power electronics market with several cluster ALD system sales to prominent manufacturers in Europe, USA and Asia.

Key Points: 
  • ESPOO, Finland, Oct. 6, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, strengthens its position in power electronics market with several cluster ALD system sales to prominent manufacturers in Europe, USA and Asia.
  • At Picosun, we have developed several turn-key production ALD solutions specifically for 4-8 inch wafer markets such as power devices.
  • Power components are crucial in a wide range of applications from consumer electronics to transportation, energy production and distribution, including renewables such as wind and solar power generation.
  • Innovation, constant development and improvement of our ALD solutions to enable our customers' success is our driving force at Picosun.

Picosun's cluster ALD solutions enable next generation power electronics

Retrieved on: 
Tuesday, October 6, 2020
Semiconductor device fabrication, Articles, Thin film deposition, Physical sciences, Chemistry, Atomic layer deposition, ALD, Thin film, Wafer, Renewable energy

ESPOO, Finland, Oct. 5, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, strengthens its position in power electronics market with several cluster ALD system sales to prominent manufacturers in Europe, USA and Asia.

Key Points: 
  • ESPOO, Finland, Oct. 5, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, strengthens its position in power electronics market with several cluster ALD system sales to prominent manufacturers in Europe, USA and Asia.
  • At Picosun, we have developed several turn-key production ALD solutions specifically for 4-8 inch wafer markets such as power devices.
  • Power components are crucial in a wide range of applications from consumer electronics to transportation, energy production and distribution, including renewables such as wind and solar power generation.
  • Innovation, constant development and improvement of our ALD solutions to enable our customers' success is our driving force at Picosun.

TANAKA Develops "TRuST" Precursor for CVD/ALD Processes; Using Liquid Ruthenium Precursor to Achieve World's Highest Vapor Pressures

Retrieved on: 
Wednesday, September 30, 2020
Chemistry, Chemical elements, Physical sciences, Precious metals, Ruthenium compounds, Thin film deposition, Semiconductor device fabrication, Tanaka Kikinzoku, Ruthenium, Chemical vapor deposition of ruthenium, Atomic layer deposition

(Head office: Chiyoda-ku, Tokyo; Representative Director & CEO: Koichiro Tanaka), which operates the TANAKA Precious Metals manufacturing business, has developed a new liquid ruthenium precursor named "TRuST" for CVD[1] and ALD[2] processes.

Key Points: 
  • (Head office: Chiyoda-ku, Tokyo; Representative Director & CEO: Koichiro Tanaka), which operates the TANAKA Precious Metals manufacturing business, has developed a new liquid ruthenium precursor named "TRuST" for CVD[1] and ALD[2] processes.
  • CVD and ALD processes enable the formation of films with superior step coverage on various types of base substrate.
  • TANAKA Kikinzoku Kogyo has developed a range of precious metal precursors over the years, including ruthenium precursors.
  • As a result, this compound has the world's highest vapor pressure over 100 times higher than that of previous liquid ruthenium precursors.

Picosun's ALD technology boosts UVC LED performance

Retrieved on: 
Thursday, September 24, 2020
Ultraviolet radiation, Semiconductor device fabrication, Thin film deposition, Physical sciences, Atomic layer deposition, Ultraviolet, ALD, Chemistry, UVC, Natural sciences

ESPOO, Finland, Sept. 24, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating technology, reports excellent results in UVC (ultraviolet-C) LED performance, achieved with the company's ALD solutions.

Key Points: 
  • ESPOO, Finland, Sept. 24, 2020 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating technology, reports excellent results in UVC (ultraviolet-C) LED performance, achieved with the company's ALD solutions.
  • Our PICOSUN ALD equipment yields superior quality films which has helped us to achieve several breakthroughs in our LED research.
  • Short-wavelength UVC radiation destroys bacteria and viruses so UVC LED technology is particularly topical now during the still ongoing COVID-19 pandemic.
  • "We are happy of the achievements of Professor Kuo's group at NCTU, and how Picosun's ALD technology has helped them to achieve their goals in UVC LED development.