High-tech fab in Dresden receives state-of-the-art electron-beam lithography system
JENA, Germany, Jan. 10, 2024 /PRNewswire/ -- Jenoptik is investing a low double-digit million-euro amount in a state-of-the-art system for the high-tech fab currently under construction in Dresden. The new electron-beam lithography system (E-Beam) will be used to manufacture high-precision micro-optical components for customers in the semiconductor and optical communication sectors. The manufacturer is the Jena based e-beam technology specialist Vistec Electron Beam GmbH. The system will be delivered at the beginning of 2025.
- JENA, Germany, Jan. 10, 2024 /PRNewswire/ -- Jenoptik is investing a low double-digit million-euro amount in a state-of-the-art system for the high-tech fab currently under construction in Dresden.
- The new electron-beam lithography system (E-Beam) will be used to manufacture high-precision micro-optical components for customers in the semiconductor and optical communication sectors.
- This type of electron-beam lithography system can "write" structures with a precision in the 10-nanometer range (approximately 1/2,000th of a hair) on substrates up to 300 mm in diameter.
- The Vistec SB3050-2 electron-beam lithography system is based on the so-called Variable Shaped Beam principle, with which even large areas can be structured highly accurately and effectively.