Pall Corporation invests in new state-of-the-art manufacturing facility to support growing semiconductor demand
The new facility will primarily produce lithography and wet-etch filtration, purification and separation solutions that will help meet the high demand for advanced node solutions.
- The new facility will primarily produce lithography and wet-etch filtration, purification and separation solutions that will help meet the high demand for advanced node solutions.
- The facility will be located on a seven-acre campus that will include more than 18,000 square meters of manufacturing and office space.
- This facility will help support the rapid pace of innovation necessary for our customers to meet growing end market demand," said Naresh Narasimhan, President of Pall Corporation.
- To support the new site, the company plans to hire more than 300 employees with science, engineering and manufacturing experience.